Current Density(CD)와 Retention Time(τ)로 선택하였다. (필터링은 전기응집 전에 전처리 및 후처리로 사용하였다.) 두 가지 설계변수를 통하여 전기응집을 진행하고 CMP 폐수내의 SiO2 Removal Efficiency(ε)을 종속 변인으로 고려하였다.
Charge Loading이 Current Density와 Retention Time의 함수라는 것과 Removal Efficiency가
1.1. SEM
Scanning Electron Microscope(SEM) 기법은 전자총으로 전자를 물질에 주사하여 튀어나오는 2차 전자, x선 등을 분석해서 물질표면의 미세구조를 관찰하거나 구성원소를 분석하는 장비이다.
1. 실험과정
1.1. 실험 준비 과정
1.1.1. Bath 만들기 (500 mL)
① (분자량 249.68) 0.5 M 500 mL를 만들기 위
● Definition of plasma
Plasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artificially created and controlled for
Introduction (What is plasma?)
1. Definition of plasma
Plasma is one of the four fundamental states of matter, along with solid, liquid, and gas. It is an ionized gas consisting of a collection of charged particles, including ions, electrons, and neutral atoms or molecules. Plasma can be found naturally in the universe in the form of stars, lightning, and auroras, but it can also be artif
Mid-1800s - Beginning research of Embryo
1908 – ‘Stem Cell’ from Alexander Maksimov
1963 – Self reproducing cell
1978 – Found Blood stem cell
1981 - Embryonic stem cell
1998 - Human's embryonic stem cell
2001 – First human embryo cloning
(중략)
2.1 Adult Stem Cell - How?From Bone Marrow
HSCs and MSCs are rich in b
1. 태양광 발전의 특징
태양광 산업은 무한정 무공해의 자원을 활용하여 전기를 생성하는 신재생 에너지원으로 1990년대 이후 기후변화협약에 따른 환경문제가 범세계적으로 심각하게 대두됨에 따른 삶의 질을 향상시킬 수 있는 환경 친화적 에너지 기술로서, 태양광을 받아 전기를 발생하는 태양전
국제전기통신위성기구
[ International Telecommunication Satellite Organization ]
: 상업통신 위성 발사 및 통신위성 개발을 위한 국제적 상업통신조직
국제전기통신위성기구가 쏘아 올린 상업통신위성
Intelsat, Ltd. 통신위성 서비스 제공업체 (2001. 7. 18)
설립 배경
- 국제연합총회 결의 제17
3. Requirements of EUV resist
EUV is highly absorbed by all materials, even EUV optical components inside the lithography tool are susceptible to damage, mainly manifest as observable ablation. Such damage that is associated with the high-energy process of generating EUV radiation is a new concern specific to EUV lithography .
EUVL's shorter wavelength also increases flare, resulting in less
The atmosphere shields us from the sun's cancer-causing ultraviolet (UV) radiation and also moderates the earth's climate.
The atmosphere is obviously vital for human existence, but we have nevertheless been polluting it for years.
The atmosphere is obviously vital for human existence, but we have nevertheless been polluting it for years.
The atmosphere can be divided vertically into four m
(4) Double patterning
The double patterning is divided into four parts, leading with wafer requirements and then two sets of lithographic requirements (Generic Pitch Splitting - Double Patterning Requirements Driven by MPU metal Half-Pitch and Generic Spacer Patterning Requirements - Driven by Flash). The lithography requirements are different for each process; the requirements for pitch splitti